实验本意是好的,只是学生操作的时候出了点问题
关键代码
1 2 3 4 5 6 7 8 9 10 11 12 13 14 15 16 17 18 19 20 21 22 23 24 25 26 27 28 29 30 31 32 33 34 35 36 37 38 39 40 41 42 43 44 45 46 47 48 49 50 51 52 53 54 55 56 57 58 59 60 61 62 63 64 65 66 67 68 69 70 71 72 73 74 75 76 77 78 79 80 81 82 83 84 85 86 87 88 89 90 91 92 93 94 95 96 97 98 99 100 101 102 103 104 105 106 107 108 109 110 111 112 113 114 115 116 117 118 119 120 121 122 123 124 125 126 127 128 129 130 131 132 133 134 135 136 137 138 139 140 141 142 143
| ;;;;;;;;;;;;;;;;;;;;;;;;;;; n1-dvs.cmd ;;;;;;;;;;;;;;;;;;;;;; (sde:clear) (sde:set-process-up-direction "+z")
(sdegeo:set-default-boolean "ABA")
;vertical parameters
(define TPP 3.0) (define TN 5.0) (define TNN 2.0)
;********************************* Create region **********************************
;-create Si (sdegeo:create-rectangle (position 0.0 0.0 0.0) (position 5.0 10.0 0.0) "Silicon" "R.Si")
;***************************************** Doping **********************************
;PP doping ; Constant doping profile in a box-shaped area (define NAME "PP") ; - Common dopants: ; "PhosphorusActiveConcentration" | "ArsenicActiveConcentration" ; | "AluminumActiveConcentration" (sdedr:define-refinement-window (string-append "RW." NAME) "Rectangle" (position 0.0 0.0 0.0) (position 5.0 3.0 0.0) ) (sdedr:define-constant-profile (string-append "DC." NAME) "AluminumActiveConcentration" 5.0e18 ) (sdedr:define-constant-profile-placement (string-append "CPP." NAME) (string-append "DC." NAME) (string-append "RW." NAME) )
;N doping ; Constant doping profile in a box-shaped area (define NAME "N") ; - Common dopants: ; "PhosphorusActiveConcentration" | "ArsenicActiveConcentration" ; | "AluminumActiveConcentration" (sdedr:define-refinement-window (string-append "RW." NAME) "Rectangle" (position 0.0 3.0 0.0) (position 5.0 8.0 0.0) ) (sdedr:define-constant-profile (string-append "DC." NAME) "NitrogenActiveConcentration" 1.0e16 ) (sdedr:define-constant-profile-placement (string-append "CPP." NAME) (string-append "DC." NAME) (string-append "RW." NAME) )
;NN doping ; Constant doping profile in a box-shaped area (define NAME "NN") ; - Common dopants: ; "PhosphorusActiveConcentration" | "ArsenicActiveConcentration" ; | "AluminumActiveConcentration" (sdedr:define-refinement-window (string-append "RW." NAME) "Rectangle" (position 0.0 8.0 0.0) (position 5.0 10.0 0.0) ) (sdedr:define-constant-profile (string-append "DC." NAME) "NitrogenActiveConcentration" 1.0e20 ) (sdedr:define-constant-profile-placement (string-append "CPP." NAME) (string-append "DC." NAME) (string-append "RW." NAME) )
;************************************ Contact define ******************************* ;Anode Contact ; - Assign a user-given contact to the surface elements (2d: edges, 3d: faces) ; - identified by the user-given point. (define CONT "anode") (define POINT (position 2.5 0.0 0.0)) (sdegeo:define-contact-set CONT 4.0 (color:rgb 1.0 0.0 0.0 ) "##" ) (sdegeo:set-current-contact-set CONT) ; - 2D: (sdegeo:define-2d-contact (find-edge-id POINT) CONT) ; - 3D: ; (sdegeo:define-3d-contact (find-face-id POINT) CONT)
;Cathode Contact ; - Assign a user-given contact to the surface elements (2d: edges, 3d: faces) ; - identified by the user-given point. (define CONT "cathode") (define POINT (position 2.5 10.0 0.0)) (sdegeo:define-contact-set CONT 4.0 (color:rgb 1.0 0.0 0.0 ) "##" ) (sdegeo:set-current-contact-set CONT) ; - 2D: (sdegeo:define-2d-contact (find-edge-id POINT) CONT) ; - 3D: ; (sdegeo:define-3d-contact (find-face-id POINT) CONT)
;******************************** Mesh ****************************************
(sdedr:define-refeval-window "RW.Global" "Rectangle" (position 0.0 0.0 0.0) (position 5.0 10.0 0.0) )
(sdedr:define-refinement-size "RD.Global" 2.0 0.5 0.03 0.03 )
(sdedr:define-refinement-function "RD.Global" "DopingConcentration" "MaxTransDiff" 1.0)
(sdedr:define-refinement-function "RD.Global" "hDensity" "MaxTransDiff" 1.0)
(sdedr:define-refinement-function "RD.Global" "ElectrostaticPotential" "MaxTransDiff" 1.0)
(sdedr:define-refinement-function "RD.Global" "MaxLenInt" "Silicon" "Contact" 1e-3 1.2 )
(sdedr:define-refinement-placement "RPL.Global" "RD.Global" "RW.Global")
(sde:build-mesh "-AI" "n1")
|
1 2 3 4 5 6 7 8 9 10 11 12 13 14 15 16 17 18 19 20 21 22 23 24 25 26 27 28 29 30 31 32 33 34 35 36 37 38 39 40 41 42 43 44 45 46 47 48 49 50 51 52 53 54 55 56 57 58 59 60 61 62 63 64 65 66 67 68
| ;;;;;;;;;;;;;;;;;;;;;;;;;;; pp2-des.cmd ;;;;;;;;;;;;;;;;;;;;;;
File { Grid= "n1_msh.tdr" Current = "n2_des.plt" Plot = "n2_des.tdr" Output= "n2_des.log" Parameter= "pp2_des.par" }
Electrode{ {Name= "anode" Voltage= 0.0} {Name= "cathode" Voltage= 0.0} }
Physics(Material="Silicon"){ Fermi Mobility( DopingDependence Enormal HighFieldSaturation ) Recombination( SRH(Dopingdependence) Auger ) EffectiveIntrinsicDensity(OldSlotboom) }
Math { Digits= 7 Extrapolate ErrEff(electron)= 1e4 ErrEff(hole)= 1e4 RHSmin= 1e-20 RHSmax= 1e30 RHSFactor= 1e30 Notdamped= 20 Iterations= 15 ExitOnFailure eMobilityAveraging= ElementEdge hMobilityAveraging= ElementEdge ExtendedPrecision(128) NumberofThreads= 4 }
Solve { *- Initial Solution Coupled(Iterations=1000 LineSearchDamping=1e-2){ Poisson } Coupled(Iterations=1000 LineSearchDamping=1e-2){ Poisson Electron } Coupled(Iterations=1000 LineSearchDamping=1e-2){ Poisson Electron Hole } NewCurrentFile= "IV_" Quasistationary ( Initialstep= 1e-3 Increment= 1.5 Decrement= 2.0 Maxstep= 0.05 Minstep= 1.e-10 Goal { Name="anode" Voltage= 10.0 } ) { Coupled { Poisson Electron Hole } } }
|
仿真结果
图就不放了。最终器件仿真结果应该是一个PiN二极管,对其进行正偏压副偏压扫描。